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PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY

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PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY

PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY
PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY

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Product Details:
Place of Origin: CHINA
Brand Name: ZG
Certification: CE
Model Number: MS
Payment & Shipping Terms:
Minimum Order Quantity: 1 piece
Price: USD10/piece
Packaging Details: Strong wooden box for Global shipping
Delivery Time: 3 working days
Payment Terms: L/C, D/A, D/P, T/T, Western Union, MoneyGram
Supply Ability: 10000 pieces per month
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PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY

Description
Application: Fine Chemical Industry, Pharmaceutical Industry, Environmental Protection Engineering Dimension: The Maximum Diameter Of Tube Bundle Block Can Reach 200mm, And The Height Can Be 500mm.
Material: Silicon Carbide Color: Black
Product Name: Silicon Carbide Tube Bundle Block
Highlight:

330mm Silicon Carbide PVD Tray

,

300mm Silicon Carbide PVD Tray

,

330mm SiC PVD Tray

 

SiC PVD Tray

 

 

Silicon carbide PVD tray is formed by isostatic pressing process and sintering at high temperature. The outer diameter, thickness, number and size of acupoints, position and shape of the tablet groove can also be finished according to the requirements of the user's design drawings to meet the specific requirements of the user.

 
Typical applications
  • Physical Vapor Deposition (PVD) process is used in LED chip manufacturing.
 
Features and advantages
  • High density
  • Good thermal conductivity, low coefficient of expansion and temperature uniformity
  • Plasma impact resistance
  • Resistant to all kinds of strong acid and alkali chemical reagent corrosion
  • After semiconductor grade cleaning
 
Specifications 230/300/330mm
PHYSICAL VAPOR DEPOSITION (PVD) PROCESS IS USED IN LED CHIP MANUFACTURING，SIC PVD TRAY 0

Tag:

SiO2 Alumina Ceramic Crucible,

Glass Melting Alumina Ceramic Crucible,

High Purity 99% Al2O3 ceramics

Contact Details
HENAN ZG INDUSTRIAL PRODUCTS CO.,LTD

Contact Person: Daniel

Tel: 18003718225

Fax: 86-0371-6572-0196

Send your inquiry directly to us (0 / 3000)

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