Product Details:
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Application: | Semiconductor , Photomask , Microwave Filter , Optical Lense , And Optical Fiber | Diameter: | Ø 1" / Ø 2" / Ø 3" / Ø 4" |
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Thickness: | 0.5 Mm / 1 Mm | Crystal Structure: | Cubic / Hexagonal / Tetragonal |
Highlight: | UV Grade Clear Quartz Substrate,Fused Silica Clear Quartz Substrate,Optical Grade Fused Quartz Wafer |
high quality clear quartz substrate , including fused silica wafer and fused quartz wafer in UV grade , optical grade an
We provides high quality clear quartz substrate , including fused silica wafer and fused quartz wafer in UV grade , optical grade and semiconductor grade . Quartz wafer have many unique features such as high working temperature , high anti corrosion , good thermal conductivity , high optical transmittance and low dielectric loss , these special features make quartz wafer suitable for semiconductor , photomask , microwave filter , optical lense , and optical fiber application . Quartz wafer can be fabricated in round or square shape , with a SEMI flat or without flat , one side polished or two sides polished , size from 1" to 12 " , thickness range from 0.4 , 0.5 , 0.7 , 1.1 to 3 mm , ultrasonic cleaning and cleanroom compatible wafer cassette package are also available. Additionally , we offer custom specifications designed to your unique needs including , dimension , SEMI. standard flats , surface roughness , edge profile , thickness , flatness , surface quality , cleanliness package method . We have amorphous quartz wafer in stock and can machine to your specification with high precision surface finish . Please contact us for further product information .
High working temperature | High optical transmission |
High stability | High anti corrosion |
Good thermal conductivity | low dielectric loss |
Stable dielectric constant | Superior mechanical properties |
Fused silica wafer ( Synthetic silica ) |
Fused quartz wafer ( Natual silica ) |
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High OH content >1200 | Low OH content > 150 |
Higher transmission in the UV range | Lower transmission in the UV range |
Free bubbles and inclusions | Contain bubbles and inclusions |
Very low fluorescence | High fluorescence |
Impurity 5 ppm | Impurity 20 ~ 40 ppm |
Chemical formula | SiO2 |
Mechanical Properties | |
Density | 2.2 g / cm3 |
Poisson's ratio | 0.14 ~ 0.17 |
Young's modulus | 72000 Mpa |
Rigidity modulus | 31000 Mpa |
Moh's hardness | 5.5 ~ 6.5 |
Thermal Properties | |
Transformation point | 1120 °C |
Softening point | 1680 °C |
Specific heat ( 20 ~ 350 °C ) | 670 J / kg °C |
Thermal conductivity ( 20 °C ) | 1.4 W / m °C |
Thermal expansion coefficient | 5.5×10 -7 cm / cm °C |
Electrical Properties | |
Resistivity | 7E7 ohm-cm |
Insulating strength | 250 ~ 400 Kv / cm |
Dielectric constant e | 3.7~ 3.9 |
Dielectric absorption coefficient. | < 4E4 |
Dielectric waste coefficient. | < 1E4 |
Optical Properties | |
Refractive index ( @ 589 nm ) | Nd =1.4584 |
Contact Person: Daniel
Tel: 18003718225
Fax: 86-0371-6572-0196