H Dual-Head Ceramic Valveless Constant-Flow Plunger Pump

H Dual-Head Ceramic Valveless Constant-Flow Plunger Pump — Product Specification & Description

1. Product Overview

The H Dual-Head Ceramic Valveless Constant-Flow Plunger Pump is a heavy-duty, pulse-free fluid delivery system engineered for high-pressure, continuous-metering applications. Built upon the robust "H-Type" structural platform, this pump integrates two precision rotating-and-reciprocating ceramic plungers operating in synchronized alternating phases. By pairing dual high-pressure pump heads with a valveless positive-displacement mechanism, it completely eliminates flow pulsation, pressure fluctuations, and valve clogging, making it ideal for high-viscosity media, abrasive slurries, and critical continuous-process dosing.

2. Key Features & Advantages

• Pulse-Free Constant Flow: Alternating dual-plunger stroke synchronization cancels out intake/discharge flow ripple, delivering a smooth, uninterrupted, and linear liquid stream without pulsation dampeners.

• Heavy-Duty High-Pressure Capability: Reinforced mechanical drive assembly enables stable continuous dosing at working pressures up to $1.6text{ MPa}$ ($16text{ bar}$) without volumetric deflection or flow degradation.

• Valveless Positive Displacement: Replaces conventional check valves, springs, and elastomeric seals with rotating-reciprocating ceramic plungers, preventing valve sticking, backflow, and mechanical wear.

• Dual-Channel Flexibility: Supports dual operating modes:

  • Synchronous Parallel Mode: Achieves pulse-free constant flow or double output volume.

  • Proportional Dual-Liquid Mode: Delivers independent, highly accurate ratio mixing for two distinct fluids.

• Sapphire-Grade Ceramic Fluid Path: Lapped zirconia ($ZrO_2$) or alumina ($Al_2O_3$) plungers and sleeves feature near-zero clearance fits ($le 2,mutext{m}$), providing self-lubricating, wear-resistant, and non-particle-shedding operation.

• High-Viscosity & Slurry Handling: Capable of metering viscous gels, slurries, and shear-sensitive liquids up to $30,000text{ mPa}cdottext{s}$ (cps).

3. Technical Specifications

4. Primary Applications

1. Lithium Battery Manufacturing: Continuous, pulse-free slurry feeding and high-pressure electrolyte injection in automated battery cell production.

2. In-Line Chemical Ratio Mixing: Continuous, pulse-free proportioning and mixing of two-component resins, adhesives, polymers, or reactive catalysts under high pressure.

3. Pharmaceutical & Biotechnology Processing: Continuous feeding of nutrient media, reagents, buffers, and active pharmaceutical ingredients (APIs) into reactors, chromatography columns, and filling lines.

4. Semiconductor & Precision Coating: Continuous, uniform delivery of chemical mechanical planarization (CMP) slurries, photoresists, conductive pastes, and protective coatings.

5. Customization Options

• Drive & Control Integration: Independent dual-motor control via PLC, RS485 (Modbus-RTU), CANopen, or Industrial Ethernet (EtherCAT/PROFINET).

• Thermal Management: Optional integrated heating/cooling jackets on pump bodies for high-viscosity or temperature-sensitive liquids.

• Port Interfaces: High-pressure NPT/UNF threaded connectors, quick-release sanitary tri-clamp fittings, or custom heavy-duty flange interfaces.